分类： 产品

Halocarbon 23 (CHF3): Used as a cleaning gas in the semiconductor industry and as a refrigerant. Purity ranges typically from

卤化碳 14（CF4）：在半导体工业中广泛用作等离子蚀刻气体和制冷剂。纯度：99.999%。

锗（GeH4）：用于半导体生产，尤其是锗薄膜的沉积。纯度：99.999%

二硅烷（SiH3）2：主要用于半导体工业的硅层外延生长。纯度：99.999%。

Dichlorosilane (SiH2Cl2): Used in the production of semiconductor materials and as a precursor for silicon deposition in chemical vapor deposition

Diborane is a chemical compound that consists of boron and hydrogen atoms and has a molecular formula B2H6. This substance

The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such

Boron Trifluoride, BF3, is a colourless, toxic, nonflammable, corrosive, high-pressure gas.   Applications In the semiconductor industry, boron trifluoride is

Boron trichloride.BCl₃ is the main gas composition in High-K and metal anisotropic plasma etch. Atomic layer etch and pulsed plasma

Ammonia, a kind of inorganic substance with chemical formula of NH3 and molecular weight of 17.031, is colorless and has