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Tungsten hexafluoride (WF6): Employed as a precursor gas in the deposition of tungsten films for semiconductor manufacturing and in the production of tungsten compounds. Purity:99.999%

Trimethylboron (B(CH3)3): Used as a precursor in chemical vapor deposition (CVD) processes for the deposition of boron-containing thin films. Purity:99%

Trichlorosilane (SiHCl3): Primary precursor for the production of ultra-pure silicon for semiconductor manufacturing. Purity:99.9%

Sulfur hexafluoride (SF6): Widely used as an electrical insulator in high-voltage applications, as a dielectric gas in switchgear, and in the production of magnesium and aluminum. Purity :99.99%

Sulfur dioxide is a colorless gas at room temperature with a pungent odor. It has strong permeability, can penetrate into various gaps quickly, and is easily absorbed by items, especially wet items. Sulfur dioxide is toxic to humans, and the maximum allowable concentration in the air is 15mg/m3.   Gas…

Silicon tetrafluoride (SiF4): Used in the production of silicon for semiconductor manufacturing and as a fluorinating agent in organic synthesis. Purity 99.99%

Silicon tetrachloride (SiCl4): Employed in the production of silicon for semiconductor manufacturing and in the synthesis of organosilicon compounds. Purity ：99.99%

Silanes are compounds of silicon and hydrogen, including monosilane (SiH4), disilane (Si2H6), and some higher-order silicon-hydrogen compounds. Among them, monosilane is the most common, and monosilane is sometimes abbreviated as silane. Silane is a colorless, air-reactive and suffocating gas. Gas Silane CAS No. 7803-62-5 Purity ≥99.9% Applications     Glass…

Phosphine (PH3): Utilized in the semiconductor industry for the deposition of compound semiconductors and in the production of certain chemicals. Purity:99.999%~99.9999%