Category: High Purity Electronic Gases

The chemical formula of xenon is kr, which is a natural noble gas with the largest relative atomic mass and the highest density. The main

Tungsten hexafluoride (WF6): Employed as a precursor gas in the deposition of tungsten films for semiconductor manufacturing and in the production of tungsten compounds. Purity:99.999%

Trimethylboron (B(CH3)3): Used as a precursor in chemical vapor deposition (CVD) processes for the deposition of boron-containing thin films. Purity:99%

Trichlorosilane (SiHCl3): Primary precursor for the production of ultra-pure silicon for semiconductor manufacturing. Purity:99.9%

Sulfur hexafluoride (SF6): Widely used as an electrical insulator in high-voltage applications, as a dielectric gas in switchgear, and in the production of magnesium and

Sulfur dioxide is a colorless gas at room temperature with a pungent odor. It has strong permeability, can penetrate into various gaps quickly, and is

Silicon tetrafluoride (SiF4): Used in the production of silicon for semiconductor manufacturing and as a fluorinating agent in organic synthesis. Purity 99.99%

Silicon tetrachloride (SiCl4): Employed in the production of silicon for semiconductor manufacturing and in the synthesis of organosilicon compounds. Purity ：99.99%

Silanes are compounds of silicon and hydrogen, including monosilane (SiH4), disilane (Si2H6), and some higher-order silicon-hydrogen compounds. Among them, monosilane is the most common, and