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Nitrogen trifluoride (NF3): Used in the semiconductor industry as a cleaning gas for chemical vapor deposition (CVD) chambers. Purity:99.99%

Neon is a colorless, odorless and odorless gas. It is gaseous at room temperature and is an inert gas. Its melting point is -248.67°C and its boiling point is 246°C. Since neon gas is a rare gas, most companies have limited supply capacity. At present, neon gas is in short…

Methylsilane (CH3SiH3): Used as a precursor gas in the deposition of silicon films in semiconductor manufacturing. Purity：99.99%

Krypton is a colorless, odorless and tasteless gas. The boiling point is -153.35℃, and the content of krypton in the atmosphere is extremely low (1.14×10-6 by volume), so that the price is also extremely high. Krypton is chemically inert under all normal conditions. It does not combine with other elements…

Hydrogen fluoride (HF): Widely used in the semiconductor industry for etching silicon dioxide and other materials. Purity:99.99%

Hydrogen bromide (HBr): Used in various organic synthesis reactions and as a catalyst in certain chemical processes. Purity :5N

Halocarbon c318，C4F8, also known as octafluorocyclobutane, is a colorless, odorless, nonflammable gas composed of carbon and fluorine atoms. It is commonly used in various industrial applications due to its unique properties.C4F8 plays a crucial role in the semiconductor industry and other advanced manufacturing sectors where precise and controlled etching and…

Halocarbon 218 (C3F8): Primarily used as a refrigerant in low-temperature applications and as a propellant in aerosol cans. Purity ranges from 99.99% to 99.999%.

Halocarbon 116 (C2F6): Used in plasma etching processes in the semiconductor industry and as a refrigerant. Purity : 99.99%.