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Halocarbon 32 (CH2F2): Commonly used as a refrigerant and as a precursor in the production of fluoropolymers. Purity:99.9%

Halocarbon 23 (CHF3): Used as a cleaning gas in the semiconductor industry and as a refrigerant. Purity ranges typically from 99% to 99.999%.

Halocarbon 14 (CF4): Widely used as a plasma etching gas in the semiconductor industry and as a refrigerant. Purity: 99.999%.

Germane (GeH4): Used in the production of semiconductors, particularly for the deposition of germanium films. Purity: 99.999%

Disilane(SiH3)2: Primarily used in the semiconductor industry for epitaxial growth of silicon layers. Purity :99.999%.

Dichlorosilane (SiH2Cl2): Used in the production of semiconductor materials and as a precursor for silicon deposition in chemical vapor deposition (CVD) processes. Purity ：2N~3N  

Diborane is a chemical compound that consists of boron and hydrogen atoms and has a molecular formula B2H6. This substance is highly unstable at room temperature with a sweet odour. The compounds consisting of boron and hydrogen atoms are called boranes. Diborane is one of the simplest boron hydrides.  …

The chemical formula of chlorine is Cl2, which is a toxic gas. It is mainly used in high-tech fields such as large-scale integrated circuits, optical fibers, and high-temperature superconductivity. Chlorine is widely used in tap water disinfection, pulp and textile bleaching, ore refining, organic and inorganic chloride synthesis, etc. It…

Boron Trifluoride, BF3, is a colourless, toxic, nonflammable, corrosive, high-pressure gas.   Applications In the semiconductor industry, boron trifluoride is used for: p-type diffusion in silicon ion implantation.   Materials Compatibility Metals: Brass; Stainless Steel; Carbon Steel; Copper; Monel. Plastics: Kel-F; PTFE, FEP, and PFA Fluoropolymers resins; Tefzel; Polyvinylchloride; PVDF.…