Category: High Purity Electronic Gases

Phosphine (PH3): Utilized in the semiconductor industry for the deposition of compound semiconductors and in the production of certain chemicals. Purity:99.999%~99.9999%

Nitrogen trifluoride (NF3): Used in the semiconductor industry as a cleaning gas for chemical vapor deposition (CVD) chambers. Purity:99.99%

Neon is a colorless, odorless and odorless gas. It is gaseous at room temperature and is an inert gas. Its melting point is -248.67°C and

Methylsilane (CH3SiH3): Used as a precursor gas in the deposition of silicon films in semiconductor manufacturing. Purity：99.99%

Krypton is a colorless, odorless and tasteless gas. The boiling point is -153.35℃, and the content of krypton in the atmosphere is extremely low (1.14×10-6

Hydrogen fluoride (HF): Widely used in the semiconductor industry for etching silicon dioxide and other materials. Purity:99.99%

Hydrogen bromide (HBr): Used in various organic synthesis reactions and as a catalyst in certain chemical processes. Purity :5N

Halocarbon c318，C4F8, also known as octafluorocyclobutane, is a colorless, odorless, nonflammable gas composed of carbon and fluorine atoms. It is commonly used in various industrial

Halocarbon 218 (C3F8): Primarily used as a refrigerant in low-temperature applications and as a propellant in aerosol cans. Purity ranges from 99.99% to 99.999%.